Chinese Torch Inline Vacuum Plasma Cleaner Used for Plasma Surface Treatment Process in Semiconductor Packaging Fields

Product Details
After-sales Service: 1 Year
Warranty: 1 Year
Cleaning Process: Vacuum Plasma Cleaning
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Year of Establishment
2012-07-31
Management System Certification
ISO 9001, ISO 14001
  • Chinese Torch Inline Vacuum Plasma Cleaner Used for Plasma Surface Treatment Process in Semiconductor Packaging Fields
  • Chinese Torch Inline Vacuum Plasma Cleaner Used for Plasma Surface Treatment Process in Semiconductor Packaging Fields
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Basic Info.

Model NO.
VPC3i
Style
Integrated Style
Clean Type
Automatic in Line
Usage
Auto Industry, Power Industry, Petrochemical Industry, Mechanical Engineering, Metallurgical Industry
Principle
Chemical Cleaning
Certification
CE, ISO
Control
CNC
Automation
Automatic
Condition
New
Remote Control
With Remote Control
Customized
Customized
Transport Package
Plywooden Case
Specification
CE
Trademark
TORCH
Origin
Beijing, China
HS Code
8479899990
Production Capacity
10set/Month

Product Description

Chinese TORCH inline vacuum plasma cleaner used for plasma surface treatment process in semiconductor packaging fields



Chinese Torch Inline Vacuum Plasma Cleaner Used for Plasma Surface Treatment Process in Semiconductor Packaging Fields
Inline vacuum plasma cleaning machine
Modle No.: VPC3i
Manufacturer : Beijing Torch SMT Incorporated Company


I. Equipment name, type number, origin and delivery date
1.1 Equipment name: Inline vacuum plasma cleaning machine
1.2 Model No.: VPC3i
1.3 Origin (country, manufacturer): Beijing Torch SMT Incorporated Company
1.4 Delivery date: 4-8 weeks after the contract comes into effect
1.5 Mainly used for plasma surface treatment process in semiconductor enclosure fields such as silicon wafer, glass substrate, ceramic substrate, IC carrier plate, copper lead frame, large-size single-sided substrate power board, IGBT module, MEMS sensor with fixture, microwave device, filter, RF device, etc.
II Main technical performance parameters:
2.1 volume of vacuum chamber: 3L
2.2 vacuum degree:
The maximum vacuum degree of VPC3i vacuum plasma cleaner is less than 10 Pa (mechanical dry pump 8L)
2.3 Effective cleaning area:
Single cleaning area: 350 * 100 * 85mm
Plasma frequency: 13.56hz 300W  RF (volume treatment, with water cooling)
2.4 Height of vacuum chamber:
Furnace height: 100mm (effective size)
2.5 Cleaning temperature:
Low temperature cleaning (below room temperature).
2.6 Cleaning frequency: 30-120s
2.7 Cleaning effect: the dyne value can reach 70. The water drop angle is 15 degrees, and it can be optimally controlled within 10 degrees(Workshop with air cleanliness at Class 100 dust-free can be cleaned within 4 hours)
2.8 Gas can be used:
Argon, nitrogen, oxygen, nitrogen hydrogen mixture, hydrogen and formic acid, etc.
2.9 VPC3i vacuum plasma cleaning machine is equipped with software control system:
The software control system is easy to operate, it enables control equipment connecting, and various cleaning process curves can be set, and curves can be set, modify, store and select for use according to different processes; The software has its own analysis function, which can analyze the process curve. The software control system will automatically record the cleaning process, temperature curve, time and alarm related data in real time to ensure the traceability of product cleaning process.
2.10 The equipment does not need to be calibrated thus no more calibration fees will occur
2.11 Operating power consumption: 2.2kW, excluding the power consumption of chiller
2.12 The function of over temperature alarm and recording. (standard configuration)
VPC3i vacuum plasma cleaning machine is functioned with workpiece surface over temperature protection,alarming, temperature safety protection and recording of the whole machine during cleaning process.
2.13 Nitrogen, argon and other flow management and analysis systems (Software + hardware). (optional)
VPC3i vacuum plasma cleaning machine is functioned by real-time management and analysis of process gases such as nitrogen and argon consumed by the whole machine, and can record and analyze the gas consumption, daily consumption, weekly consumption and different time period consumption in real time.
2.14 Process gas pressure alarm function and analysis system (Software + hardware). (optional)
VPC3i vacuum plasma cleaning machine is functioned by undervoltage alarm, recording and analysis of process gas source in the production process of the whole machine, which is very useful for product quality traceability.
2.15 Energy management and analysis system (Software + hardware). (optional)
VPC3i vacuum plasma cleaning machine is functioned by real-time management and analysis of energy consumption, and can analyze the recording of real-time power consumption, daily power consumption, weekly power consumption, time period power consumption, etc.
2.16 Oxygen content management and analysis system (Software + hardware) (optional)
VPC3i vacuum plasma cleaning machine is functioned by real-time management and analysis of oxygen content in the vacuum chamber of the whole machine. It can analyze, record and analyze the PPM value of oxygen content in real time for product quality traceability and analysis.
2.17 MES data interface subsystem (Software + hardware). (optional)
VPC3i vacuum plasma cleaning machine is also functioned by MES data interface of the whole machine, and MES system can be selected and configured to complete various data acquisition and analysis of intelligent equipment.
2.18 Overall dimensions:
550 * 1260 * 1480mm (excluding alarm light)
2.19 Internal structure: see the right figure

III Basic composition and configuration:
No Description  configuration qty
1 vacuum plasma cleaning machine Main machine 1set
2 Plasma power system Standard configuration 1set
3 Temperature measurement system Standard configuration(4 groups of temperature measurement coupler) 1set
4 Vacuum system Standard configuration 1set
5 Mechanical pump Standard configuration 1set
6 Water cooling system Standard configuration(Industrial cooling machine is excluded) 1set
7 Industrial cooling machine Optional 1set
8 Formic acid system Standard configuration(Formic acid, gas pipeline and connection) 1set
9 Nitrogen atmosphere protection system Standard configuration(exclude nitrogen souce supplying) 1set
10 vacuum plasma cleaning machine software system Standard configuration(control software) 1set
11 Industrial computer Standard configuration 1set
12 Plasma Standard configuration 1piece
13 Temperature measurement sensor (spare parts) Standard configuration 2
14 Cooling pipeline (spare parts) Standard configuration 2
15 Process gas volume management and analysis system Optional 1set
16 Process gas pressure alarm and analysis system Optional 1set
17 Power management and analysis system Optional 1set
18 Oxygen content management and analysis system Optional 1set
19 MES data interface system Optional  

IV VPC3i Technical parameter
Brand Manufacturer Beijing Torch SMT Incorporated Company Remarks
Brief introduction Origin Beijing  
Key components  Temperature sensor US OMEGA  
Vacuum pump KYKY/BSC  
Globe valve Japan brand  
Corossion resistence valve Japan brand  
Low voltage electric system SCHNEIDER  
Botton switch Taiwan JICTEN/SCHNEIDER  
Photoelectric Omron  
Plasma power TORCH  
Key technical index Temperature Low temperature cleaning, temperature is maintained under room temperature  
Min. Vacuum degree 10pa  
Oxygen content <1ppm  
Production efficiency 20-120S  
Key process index Quality traceability 1. Process gas pressure alarm record. 2. Oxygen content alarm record. 3. Temperature over temperature alarm record. 4. Alarm record of non-compliance of vacuum value  
Intelligence and informatization 1.Intelligent function. If one of the above 4 indicators fails to meet the standard or gives an alarm, an overall alarm and prompt to stop production will be displayed to ensure the production quality. 2. Energy management system, power consumption and nitrogen consumption are counted and displayed in real time in the energy management system. 3. All above information can be seamlessly connected to MES system through data interface to facilitate the decision-making and management of management team.  
Facilities Power 380VAC,20A  
Gas Compressed air(CDA)0.5Mpa  
Nitrogen 0.5Mpa  
Vacuum Equipped with vacuum dry pump   


Note:
The control software for the vacuum plasma cleaner of Beijing Torch SMT Incorporated Company is independently developed by Beijing Torch SMT Incorporated Company and Beijing Torch SMT Incorporated Company pocesses the right of software registration without third-party certification.

The vacuum plasma cleaning machine from Beijing Torch SMT Incorporated Company has already obtained a number of national patents. Please do not risk copying!!
 

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